PROCEDIMENTO IN-SILICO DI IDENTIFICAZIONE DEL DESIGN DI UN SENSORE PLASMONICO NANOSTRUTTURATO

An in silico process for identifying the design of a nanostructured plasmonic sensor comprises the following operating steps: selecting an analyte; characterising the analyte with computational techniques; selecting at least one two- or three-dimensional nanostructured substrate having plasmonic characteristics; characterising each substrate with computational techniques; performing a mapping of the potential of interaction between the analyte and each substrate so as to identify, for each region and/or each atom of each substrate, a value of interaction with the analyte; calculating the spectral signal of the analyte adsorbed onto each substrate for at least one region and/or atom of each substrate; analytically evaluating an enhancement factor of each spectral signal calculated; and comparing each enhancement factor with a corresponding predefined minimum threshold value so as to evaluate whether the associated nanostructured plasmonic sensor is configured to perform detection of the analyte with single-molecule sensitivity.