A semiconductor laser comprises an active region ( 12 ) which, in response to a pumping energy applied thereto, can produce a stimulated emission of radiation with a central wavelength (lambda) in the far infrared region, and a confinement region ( 16, 18, 22 ) suitable for confining the radiation in the active region ( 12 ), and comprising at least one interface ( 16 a, 16 b, 22 a) between adjacent layers that is capable of supporting surface plasmon modes generated by an interaction of the interface with the radiation. The confinement region ( 16, 18, 22 ) comprises a wave-guide layer ( 16 ) which is delimited on opposite sides by a first interface and by a second interface ( 16 a, 16 b). The guide layer ( 16 ) is doped in a manner such that the first and second interfaces ( 16 a, 16 b) are capable of supporting the plasmon modes, respectively, and is of a thickness (d) such as to bring about the accumulation of the plasmon modes in proximity to the first and second interfaces ( 16 a, 16 b), outside the layer ( 16 ), and substantially a suppression of the plasmon modes, inside the layer.

THz semiconductor laser incorporating a controlled plasmon confinement waveguide

BELTRAM Fabio
2004

Abstract

A semiconductor laser comprises an active region ( 12 ) which, in response to a pumping energy applied thereto, can produce a stimulated emission of radiation with a central wavelength (lambda) in the far infrared region, and a confinement region ( 16, 18, 22 ) suitable for confining the radiation in the active region ( 12 ), and comprising at least one interface ( 16 a, 16 b, 22 a) between adjacent layers that is capable of supporting surface plasmon modes generated by an interaction of the interface with the radiation. The confinement region ( 16, 18, 22 ) comprises a wave-guide layer ( 16 ) which is delimited on opposite sides by a first interface and by a second interface ( 16 a, 16 b). The guide layer ( 16 ) is doped in a manner such that the first and second interfaces ( 16 a, 16 b) are capable of supporting the plasmon modes, respectively, and is of a thickness (d) such as to bring about the accumulation of the plasmon modes in proximity to the first and second interfaces ( 16 a, 16 b), outside the layer ( 16 ), and substantially a suppression of the plasmon modes, inside the layer.
2004
Fisica
Settore FIS/01 - Fisica Sperimentale
Settore PHYS-03/A - Fisica sperimentale della materia e applicazioni
US20040508996
IT2002TO00274
Scuola Normale Superiore di PISA
US7382806
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11384/166430
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